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Proceedings Paper

Resist Materials For High Resolution Photolithography
Author(s): W. F. Cordes, III; R. F. Leonard
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Paper Abstract

Waycoat WX-118 is a new positive photoresist characterized by high photospeed and good resolution. WX-118 is highly responsive to Deep UV radiation (270-320 nm) as well as Conventional UV (>320 nm). Details are presented on this resist in regard to: 1) absorption spectra, 2) film thickness vs. spin speed, and 3) optimum softbake and hardbake conditions. WX-118 and Hunt's HPR-204 positive resists are compared in conventional UV exposure, both in contact and 1:1 projection. SEMs are presented to illustrate the superior resolution capabilities of WX-118 in a 1:1 projection system. The Deep UV data was obtained on a UV-3 Micralign 1:1 projection system where AZ-2400 was used as a comparison. SEMs are used to present information on the unique resist sidewalls obtained with WX-118 exposed on a UV-3 Micralign projection aligner.

Paper Details

Date Published: 28 July 1981
PDF: 9 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931888
Show Author Affiliations
W. F. Cordes, III, Philip A. Hunt Chemical Corporation (United States)
R. F. Leonard, Philip A. Hunt Chemical Corporation (United States)

Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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