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Proceedings Paper

Positive Versus Negative: A Photoresist Analysis
Author(s): Peter S. Gwozdz
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Paper Abstract

Positive and negative photoresists are contrasted. Twelve parameters are listed with evaluation as to which photoresist gives superior results. Emphasized are resolution and dimension targeting. Reasons are given stating why positive gives better resolution and why dimension targeting is used.

Paper Details

Date Published: 28 July 1981
PDF: 8 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931887
Show Author Affiliations
Peter S. Gwozdz, Advanced Micro Devices, Inc. (United States)


Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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