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Proceedings Paper

Simulation Of Edge Location Error
Author(s): Steven C. Gustafson; Philip C. Handorf
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Paper Abstract

Edge location in very high-resolution images may be affected by the statistical distribution of discrete grains that collectively form the opaque regions. An ideal case is considered in which a one-dimensional edge, represented by a step probability density function, is characterized by the location and contrast (magnitude relative to a background level) of the step discontinuity. This function is randomly sampled at a number of points, and a maximum likelihood criterion and a Monte Carlo technique are used to estimate the edge location from the samples. The root mean square deviation of this estimate from the actual edge location is obtained as a function of the edge contrast, the actual edge location, and the number of samples. This simulation is applicable to a class of single straight-edge images for which the number of samples is interpreted as the number of grains in the image and for which the edge orientation is known. 4-reNAyin -inn

Paper Details

Date Published: 28 July 1981
PDF: 6 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931882
Show Author Affiliations
Steven C. Gustafson, University of Dayton Research Institute (United States)
Philip C. Handorf, University of Dayton Research Institute (United States)


Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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