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Proceedings Paper

Prospects Of A Plasma Focus Device As An Intense X-Ray Source For Fine Line Lithography
Author(s): B. Kuyel
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Paper Abstract

The technological window for X-ray lithography is examined. What seems to narrow the technological window for X-ray lithography and remove the economical advantage is not a symptom of X-ray lithography but of the conventional means of generating X-rays. The type of source needed is an intense, pulsed X-ray source of suitable wavelength range. Although laser generated and other types of plasma generated, pulsed X-ray sources are being investigated, a plasma focus device has been ignored as a possible intense, pulsed, soft X-ray source which can satisfy the requirements of X-ray lithography. Here, means of generating an intense X-ray pulse from a plasma focus device which is suitable for lithographic needs is analyzed. Estimates of energy conversion efficiencies, spectrum of radiation, duration, and intensity of the radiation pulse are presented. Optimization, scaling considerations, and engineering solutions to anticipated difficulties are discussed.

Paper Details

Date Published: 28 July 1981
PDF: 8 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931872
Show Author Affiliations
B. Kuyel, Western Electric Engineering Research Center (United States)

Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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