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Proceedings Paper

Toward Submicron Lithography
Author(s): Mary L. Long
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Paper Abstract

Sub-micron lithography has become a buzz word in an industry whose linewidths have been continually getting smaller and smaller. The trend of this industry is relatively clear; complexity has increased from the early discretes into the 1C, LSI and VLSI type circuits, and has gone from a complexity of approximately 10 functions per square inch to a range exceeding a million functions per square inch. At the same time image size, measured in microns, has decreased from standard linewidths a few years ago of five microns, down to 2 1/2 to 3 microns in current use, and projected use of l 1/2 micron to sub-micron minimum geometry.

Paper Details

Date Published:
PDF: 7 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, ; doi: 10.1117/12.931866
Show Author Affiliations
Mary L. Long, KTI Chemicals, Incorporated (United States)

Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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