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Proceedings Paper

Light Scattering Surface Roughness Characterization
Author(s): John A. Detrio
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Paper Abstract

Light scattering is a sensitive method for characterizing the topography of a smooth, reflecting surface. Particulate contaminants which may influence the yield of semiconductor devices are easily detected in scattered light. Surface irregularities which may influence the lifetime or mobility may be quantitatively evaluated by scattering. The total integrated scatter (TIS) fromoa silicon surface can be related to the rms surface roughness with a sensitivity of 10 Å. Some applications of light scattering to the char-acterization of silicon will be summarized. The TIS method for measuring the surface roughness will be presented in detail.

Paper Details

Date Published: 30 April 1981
PDF: 6 pages
Proc. SPIE 0276, Optical Characterization Techniques for Semiconductor Technology, (30 April 1981); doi: 10.1117/12.931699
Show Author Affiliations
John A. Detrio, University of Dayton Research Institute (United States)


Published in SPIE Proceedings Vol. 0276:
Optical Characterization Techniques for Semiconductor Technology
David E. Aspnes; Roy F. Potter; Samuel S. So, Editor(s)

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