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Proceedings Paper

Characterization Of Low-Doped Metal Oxide Semiconductor (MOS) Structures Using Pulsed Photoinjection
Author(s): U. Efron; J. Grinberg
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Paper Abstract

This method, aimed at determining doping level and minority carrier lifetime of low-doped semiconductors, is based on pulsing the MOS device into deep depletion. A delayed photopulse is then applied to the sample, which causes partial collapse of the depletion region. The changes in fill time and in capacitance versus collected photocharge are measured. The minority carrier lifetime is computed through the dependence of fill time on the magnitude of the photoinjected charge. The doping level is determined by the change in capacitance following the photoinjection. The method is advantageous in: (a) independently supplying the doping level and lifetime, (b) being insensitive to edge injection, and (c) enabling the determination of the diffusion length.

Paper Details

Date Published: 30 April 1981
PDF: 2 pages
Proc. SPIE 0276, Optical Characterization Techniques for Semiconductor Technology, (30 April 1981); doi: 10.1117/12.931687
Show Author Affiliations
U. Efron, Hughes Research Laboratories (United States)
J. Grinberg, Hughes Research Laboratories (United States)

Published in SPIE Proceedings Vol. 0276:
Optical Characterization Techniques for Semiconductor Technology
David E. Aspnes; Roy F. Potter; Samuel S. So, Editor(s)

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