Share Email Print
cover

Proceedings Paper

DNA nano-circuit for electronics
Author(s): Naoya Ogata
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper describes preparations of nano-scale patterned electric circuit based on high purity DNA molecules which are obtained from Salmon roe. The patterning on silicon substrate was carried out by an ink-jet method of aqueous solution of DNA. However, the Salmon-based DNA has a so huge molecular weight of over billions that even only 1wt% aqueous solution of DNA becomes gel without any fluidity. So, it is necessary to reduce molecular weights of DNA to increase fluidity of the aqueous solution of DNA, keeping the characteristic feature of double helical structures of DNA molecules to form metal-chlating complexes with various metal cations such as silver or copper cations. Several methods to reduce the molecular weight of DNA, including hydrolytic , enzymatic degradations and ultra-sonification. It was found that the best method to reduce the molecular weights (MW) of DNA was an enzymatic degradation of DNA to increase fluidity, thus being able to apply an ink-jet method for nano-scale patterning on a silicon wafer to form DNA circuit, followed by ion-crosslinking of DNA by dipping the patterned DNA circuit into aqueous solution of copper chloride. The DNA-CuCl2 patterned circuit was reduced to copper nano-lines for electric circuit, by using hydrazine as a reducing agent. Thus, all DNA devices can be prepared by the combination of DNA transistor and circuit.

Paper Details

Date Published: 10 October 2012
PDF: 9 pages
Proc. SPIE 8464, Nanobiosystems: Processing, Characterization, and Applications V, 846403 (10 October 2012); doi: 10.1117/12.930918
Show Author Affiliations
Naoya Ogata, Ogata Research Lab., Ltd. (Japan)


Published in SPIE Proceedings Vol. 8464:
Nanobiosystems: Processing, Characterization, and Applications V
Norihisa Kobayashi; Fahima Ouchen; Ileana Rau, Editor(s)

© SPIE. Terms of Use
Back to Top