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Proceedings Paper

Advanced plasma technology for large scale PECVD processes
Author(s): J. Landrock; M. Zeuner; M. Nestler; D. Rost
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Paper Abstract

MicroSystems is able to provide systems for specialized large area processing based on plasma enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) technologies. The generation of barrier layers has become an important field in a variety of applications. Systems for generating ultra-barrier layers and achieved results are presented and discussed.

Paper Details

Date Published: 13 September 2012
PDF: 6 pages
Proc. SPIE 8476, Organic Light Emitting Materials and Devices XVI, 847621 (13 September 2012); doi: 10.1117/12.930427
Show Author Affiliations
J. Landrock, MicroSystems GmbH (Germany)
M. Zeuner, MicroSystems GmbH (Germany)
M. Nestler, MicroSystems GmbH (Germany)
D. Rost, MicroSystems GmbH (Germany)


Published in SPIE Proceedings Vol. 8476:
Organic Light Emitting Materials and Devices XVI
Franky So; Chihaya Adachi, Editor(s)

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