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Proceedings Paper

Advanced multilayer Laue lens fabrication at NSLS-II
Author(s): Ray Conley; Nathalie Bouet; Juan Zhou; Hanfei Yan; Yong Chu; Kenneth Lauer; Jesse Miller; Luke Chu; Nima Jahedi
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Paper Abstract

In an ongoing effort to advance the state of the art in x-ray nanofocusing optics [1], multilayer Laue lens (MLL) [2,3] fabrication at NSLS-II has matured to include multi-gas reactive sputtering for stress and interfacial roughness reduction, which has recently led to a 70 micron thick single-growth MLL. Reactive sputtering was found to produce WSi2/Si multilayers with an accumulated film stress significantly lower than Ar-only deposition with identical growth conditions. Significant effort has been focused on the achievement of highly-stable gas mixing and process gas pressure measurement for multilayer growth and the problems faced along with implemented solutions will be discussed in detail. Proper layer thickness and placement throughout the stack presents a major obstacle to the fabrication of high-quality nanofocusing MLLs. Initial metrology of extremely thick MLLs by stitching many scanning electron microscope images was found to be greatly simplified by inclusion of marker labels within the stack.

Paper Details

Date Published: 19 October 2012
PDF: 7 pages
Proc. SPIE 8502, Advances in X-Ray/EUV Optics and Components VII, 850202 (19 October 2012); doi: 10.1117/12.930216
Show Author Affiliations
Ray Conley, Brookhaven National Lab. (United States)
Nathalie Bouet, Brookhaven National Lab. (United States)
Juan Zhou, Brookhaven National Lab. (United States)
Hanfei Yan, Brookhaven National Lab. (United States)
Yong Chu, Brookhaven National Lab. (United States)
Kenneth Lauer, Brookhaven National Lab. (United States)
Jesse Miller, Brookhaven National Lab. (United States)
Luke Chu, Northport High School (United States)
Nima Jahedi, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 8502:
Advances in X-Ray/EUV Optics and Components VII
Shunji Goto; Christian Morawe; Ali M. Khounsary, Editor(s)

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