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Proceedings Paper

Roughness characterization of EUV multilayer coatings and ultra-smooth surfaces by light scattering
Author(s): M. Trost; S. Schröder; C. C. Lin; A. Duparré; A. Tünnermann
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Paper Abstract

Optical components for the extreme ultraviolet (EUV) face stringent requirements for surface finish, because even small amounts of surface and interface roughness can cause significant scattering losses and impair image quality. In this paper, we investigate the roughness evolution of Mo/Si multilayers by analyzing the scattering behavior at a wavelength of 13.5 nm as well as taking atomic force microscopy (AFM) measurements before and after coating. Furthermore, a new approach to measure substrate roughness is presented, which is based on light scattering measurements at 405 nm. The high robustness and sensitivity to roughness of this method are illustrated using an EUV mask blank with a highspatial frequency roughness of as low as 0.04 nm.

Paper Details

Date Published: 19 October 2012
PDF: 7 pages
Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 85010F (19 October 2012); doi: 10.1117/12.929887
Show Author Affiliations
M. Trost, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich-Schiller-Univ. Jena (Germany)
S. Schröder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
C. C. Lin, SEMATECH North (United States)
A. Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
A. Tünnermann, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 8501:
Advances in Metrology for X-Ray and EUV Optics IV
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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