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Proceedings Paper

Active retroreflector to measure the rotational orientation in conjunction with a laser tracker
Author(s): O. Hofherr; C. Wachten; C. Müller; H. Reinecke
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Paper Abstract

High precision optical non-contact position measurement is a key technology in modern engineering. Laser trackers (LT) can determine accurately x-y-z coordinates of passive retroreflectors. Next-generation systems answer the additional need to measure an object’s rotational orientation (pitch, yaw, roll). These devices are based on photogrammetry or on enhanced retroreflectors. However, photogrammetry relies on camera systems and time-consuming image processing. Enhanced retroreflectors analyze the LT’s beam but are restricted in roll angle measurements. Here we present an integrated laser based method to evaluate all six degrees of freedom. An active retroreflector directly analyzes its orientation to the LT’s beam path by outcoupling laser light on detectors. A proof of concept prototype has been designed with a specified measuring range of 360° for roll angle measurements and ±15° for pitch and yaw angle respectively. The prototype’s optical design is inspired by a cat’s eye retroreflector. First results are promising and further improvements are under development. We anticipate our method to facilitate simple and cost-effective six degrees of freedom measurements. Furthermore, for industrial applications wide customizations are possible, e.g. adaptation of measuring range, optimization of accuracy, and further system miniaturization.

Paper Details

Date Published: 25 October 2012
PDF: 10 pages
Proc. SPIE 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, 84660J (25 October 2012); doi: 10.1117/12.929628
Show Author Affiliations
O. Hofherr, Albert-Ludwigs-Univ. Freiburg (Germany)
C. Wachten, PI miCos GmbH (Germany)
C. Müller, Albert-Ludwigs-Univ. Freiburg (Germany)
H. Reinecke, Albert-Ludwigs-Univ. Freiburg (Germany)


Published in SPIE Proceedings Vol. 8466:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Michael T. Postek; Victoria A. Coleman; Ndubuisi G. Orji, Editor(s)

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