Share Email Print

Proceedings Paper

Evaluation of bakeout effectiveness by optical measurement of a contaminated surface
Author(s): Hiroshi Yokozawa; Susumu Baba; Eiji Miyazaki; Yugo Kimoto
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We attempted to evaluate the effectiveness of bakeout for certain materials by using the “In-Situ Contamination Spectroscopic Analysis Chamber” newly developed by JAXA, in order to measure the optical properties of a surface contaminated by condensed outgas. In the present case, the sample (RTV-S 691; subject to four bakeout conditions) is heated at 125°C and a gold-coated mirror set opposite the sample is cooled at -10°C to collect outgassing from the sample. FT-IR is set to measure the optical properties on the surface of the gold-coated mirror inside the chamber in-situ. A thermoelectric quartz crystal microbalance (TQCM) is installed in the chamber where the view factor to the sample is equivalent to that of the gold-coated mirror used to measure the thickness of deposited contaminants at the same temperature as that of the mirror. The four bakeout conditions are no bakeout, bakeout at 60°C, at 80°C, and at 125°C for 72 hours, respectively. As a result, TQCM data showed an expected curve, revealing a lower deposition rate at higher bakeout temperature. We then plotted the absorbance for obvious FT-IR spectra peaks against the optical path length, as calculated from the deposition thickness measured using the TQCM. The absorption coefficient at certain wavenumbers was found to vary under the four bakeout conditions. This suggests an insufficient deposition thickness on the optical surface. It therefore follows that direct optical measurement should be performed to evaluate bakeout effectiveness as pertaining to the essential purpose of bakeout.

Paper Details

Date Published: 15 October 2012
PDF: 13 pages
Proc. SPIE 8492, Optical System Contamination: Effects, Measurements, and Control 2012, 84920A (15 October 2012); doi: 10.1117/12.929453
Show Author Affiliations
Hiroshi Yokozawa, Japan Aerospace Exploration Agency (Japan)
Susumu Baba, Japan Aerospace Exploration Agency (Japan)
Eiji Miyazaki, Japan Aerospace Exploration Agency (Japan)
Yugo Kimoto, Japan Aerospace Exploration Agency (Japan)

Published in SPIE Proceedings Vol. 8492:
Optical System Contamination: Effects, Measurements, and Control 2012
Sharon A. Straka; Nancy Carosso; Joanne Egges, Editor(s)

© SPIE. Terms of Use
Back to Top