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Proceedings Paper

Improved thermal stability of Mg/Co multilayer by introducing Zr barrier layer
Author(s): Haochuan Li; Sika Zhou; Xiaoqiang Wang; Jingtao Zhu; Zhanshan Wang
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Paper Abstract

High reflective multilayer mirrors are widely used as optical elements for applications such as extreme ultraviolet (EUV) microscopy, high harmonic femtosecond chemistry, solar astrophysics imaging, and synchrotron radiation. Mg-based multilayers, such as Mg/SiC, Mg/Y2O3 and Mg/Co are promising in the wavelength of 25-40 nm for Mg L3 absorption edge is located at 25 nm. Mg/Co has narrower bandwidth and better thermal stability. In applications such as synchrotron radiation and solar imaging, multilayers mirrors must endure high heat loads. Thus, we investigated the thermal stability of Mg/Co multilayer and then introduced barrier layer to improve thermal stability in this paper. The interface structures evolution was studied by using X-ray reflection/scatter technique. Mg/Co multilayer can be stable when not heated above 300°C. B4C and Zr layers were inserted into Mg/Co multilayer as interface barrier layer to improve thermal stability. According to the measured results, B4C barrier layer is not suitable for Mg/Co multilayer, mainly due to the diffusion between Mg and B4C. The introduction of Zr can significantly improve the thermal stability of Mg/Co up to 400°C without reducing EUV reflectance. Thus, introduction of Zr barrier layer is an efficient method to improve the thermal stability of Mg/Co multilayer for EUV applications such as astronomical observation and synchrotron radiation.

Paper Details

Date Published: 19 October 2012
PDF: 6 pages
Proc. SPIE 8501, Advances in Metrology for X-Ray and EUV Optics IV, 85010G (19 October 2012); doi: 10.1117/12.929448
Show Author Affiliations
Haochuan Li, Tongji Univ. (China)
Sika Zhou, Tongji Univ. (China)
Xiaoqiang Wang, Tongji Univ. (China)
Jingtao Zhu, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 8501:
Advances in Metrology for X-Ray and EUV Optics IV
Lahsen Assoufid; Peter Z. Takacs; Anand Krishna Asundi, Editor(s)

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