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Fabricating chiral, 3D micron to nanostructures in a single lithography/etch cycle using metal-assisted chemical etching
Author(s): Owen Hildreth; Konrad Rykaczewski; C. P. Wong
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Proc. SPIE 8463, Nanoengineering: Fabrication, Properties, Optics, and Devices IX, ; doi: 10.1117/12.929306
Show Author Affiliations
Owen Hildreth, Georgia Institute of Technology (United States)
Konrad Rykaczewski, National Institute of Standards and Technology (United States)
C. P. Wong, Georgia Institute of Technology (United States)


Published in SPIE Proceedings Vol. 8463:
Nanoengineering: Fabrication, Properties, Optics, and Devices IX
Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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