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Proceedings Paper

Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system
Author(s): G. A. Cirino; S. A. Lopera; A. N. Montagnoli; L. G. Neto; R. D. Mansano
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Paper Abstract

This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost homebuilt maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot mean values were 50 ± 8% μm and 0.71 ± 7% a.u , respectively. Such a MLA can be applied as Shack-Hartmann wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.

Paper Details

Date Published: 19 October 2012
PDF: 7 pages
Proc. SPIE 8489, Polymer Optics and Molded Glass Optics: Design, Fabrication, and Materials II, 848908 (19 October 2012); doi: 10.1117/12.928819
Show Author Affiliations
G. A. Cirino, CCET, Univ. Federal de São Carlos (Brazil)
S. A. Lopera, LSI-PSI, Univ. Federal de São Paulo (Brazil)
A. N. Montagnoli, CCET, Univ. Federal de São Carlos (Brazil)
L. G. Neto, EESC, Univ. de São Paulo (Brazil)
R. D. Mansano, LSI-PSI, Univ. de São Paulo (Brazil)


Published in SPIE Proceedings Vol. 8489:
Polymer Optics and Molded Glass Optics: Design, Fabrication, and Materials II
David H. Krevor; William S. Beich; Michael P. Schaub; Stefan M. Bäumer, Editor(s)

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