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Proceedings Paper

Metal substrates with nanometer scale surface roughness for flexible electronics
Author(s): Jong-Lam Lee; Kisoo Kim
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Paper Abstract

In this work, we present a novel way in fabricating a metal substrate with nanometer scale in surface roughness (Ra < 1 nm) using a surface roughness transfer method without any polishing or planarization process. Ag film (8 inch, Ra = 0.57 nm) and an INVAR (Invariable alloy) one (20 cm × 20 cm, Ra = 1.40 nm) were demonstrated. The INVAR film was used as a substrate for fabricating organic light emitting diodes (OLED) and organic photovoltaic (OPV). The optical and electrical characteristics of OLEDs and OPVs using the INVAR were comparable to those using a conventional ITO glass substrate.

Paper Details

Date Published: 13 September 2012
PDF: 3 pages
Proc. SPIE 8476, Organic Light Emitting Materials and Devices XVI, 847614 (13 September 2012); doi: 10.1117/12.928659
Show Author Affiliations
Jong-Lam Lee, Pohang Univ. of Science and Technology (Korea, Republic of)
Kisoo Kim, Pohang Univ. of Science and Technology (Korea, Republic of)


Published in SPIE Proceedings Vol. 8476:
Organic Light Emitting Materials and Devices XVI
Franky So; Chihaya Adachi, Editor(s)

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