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Proceedings Paper

High-performance dielectric diffraction gratings for space applications
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Paper Abstract

Modern electron beam lithography is a suitable technology for the fabrication of high performance gratings for spectroscopic applications. Due to a significant improved accuracy of the lithographic exposure the resulting gratings do show a very high wave-front quality, low stray-light, and grating ghosts. The high resolution accessible with e-beam writing can be used for sub-period engineering of the grating pattern in order to optimize the efficiency performance of the devices. This is demonstrated by different examples of pure dielectric reflection and transmission gratings developed for space missions. One is the Sentinel-4 earth observation mission; the second is the astrometry satellite GAIA of the ESA.

Paper Details

Date Published: 13 September 2012
PDF: 7 pages
Proc. SPIE 8450, Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II, 84502Z (13 September 2012); doi: 10.1117/12.928286
Show Author Affiliations
Uwe D. Zeitner, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Friedrich-Schiller-Univ. Jena (Germany)
Frank Fuchs, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
E.-Bernhard Kley, Fraunhofer Institute of Applied Optics and Precision Engineering (Germany)
Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 8450:
Modern Technologies in Space- and Ground-based Telescopes and Instrumentation II
Ramón Navarro; Colin R. Cunningham; Eric Prieto, Editor(s)

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