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Proceedings Paper

Uniform coating of high aspect ratio surfaces through atomic layer deposition
Author(s): Mark Nolan; Ian Povey; Simon Elliot; Nicolas Cordero; Martyn Pemble; Brian Shortt; Marcos Bavdaz
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Paper Abstract

Innovative X-ray ray imaging optic technologies, Silicon Pore Optics for example, are often characterised by large length to pore diameter aspect ratios. Such ratios present challenges to the deposition of reflectivity enhancing metallic coatings onto the mirror substrate surfaces. The technique of Atomic Layer Deposition (ALD) is perfectly suited to addressing this challenge due to the inherent self-limiting nature of the process which yields highly uniform coatings with surface roughness compatible with the requirements of high resolution X-ray imaging. We describe the results of a project aimed at developing an optimised ALD reactor and process to coat the internal wall surfaces of high aspect ratio samples with a uniform and smooth metallic layer. For sample substrates of aspect ratio ~100 the reactor has realised an average gradient of 1nm in the thickness of an Al2O3 coating on the internal walls of a 76 mm long glass tube.

Paper Details

Date Published: 27 September 2012
PDF: 8 pages
Proc. SPIE 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray, 84433O (27 September 2012); doi: 10.1117/12.924876
Show Author Affiliations
Mark Nolan, Tyndall National Institute (Ireland)
Ian Povey, Tyndall National Institute (Ireland)
Simon Elliot, Tyndall National Institute (Ireland)
Nicolas Cordero, Tyndall National Institute (Ireland)
Martyn Pemble, Tyndall National Institute (Ireland)
Brian Shortt, ESA/ESTEC (Netherlands)
Marcos Bavdaz, ESA/ESTEC (Netherlands)

Published in SPIE Proceedings Vol. 8443:
Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray
Tadayuki Takahashi; Stephen S. Murray; Jan-Willem A. den Herder, Editor(s)

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