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Proceedings Paper

Development of water-developable resist material derived from biomass in EB lithography
Author(s): Satoshi Takei; Akihiro Oshima; Takanori Wakabayashi; Atsushi Sekiguchi; Takahiro Kozawa; Seiichi Tagawa
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Paper Abstract

A water developable, non-chemically amplified, high sensitive, and negative tone resist material in the developable process of EB lithography was investigated for environmental affair, safety, easiness of handling, and health of the working people, instead of the common developable process of trimethylphenylammonium hydroxide or resist solvents. The material design concept to use the plantbased resist material derived from biomass was proposed. A novel high-sensitive negative tone of plantbased resist material with the sugar chain structure derived from biomass on underlayer was demonstrated in EB lithography for the future production of optical and electronic devices. The 400 nm line patterning images with exposure dose of 7.0 μC/cm2 were provided by specific process conditions of EB lithography for optical and electronic devices.

Paper Details

Date Published: 9 May 2012
PDF: 8 pages
Proc. SPIE 8428, Micro-Optics 2012, 84281V (9 May 2012); doi: 10.1117/12.924802
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Japan Science and Technology Agency (Japan)
Akihiro Oshima, Osaka Univ. (Japan)
Takanori Wakabayashi, Toyama Prefectural Univ. (Japan)
Atsushi Sekiguchi, Toyama Prefectural Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Japan Science and Technology Agency (Japan)


Published in SPIE Proceedings Vol. 8428:
Micro-Optics 2012
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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