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Proceedings Paper

Development of plant-based resist material derived from biomass on hardmask layer in ultraviolet curing nanoimprint lithography
Author(s): Satoshi Takei
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Paper Abstract

Nanopatterning printability due to high sensitivity and low film thickness shrinkage of ultraviolet curing process in resist material was one of key to achieve high resolution and quality of nanoimprint lithography. The new ultraviolet curing plant-based resist material derived from biomass was investigated to achieve high quality of 100 nm line and space patterning images in the optimized conditions of ultraviolet curing nanoimprint lithography technology for the optical films containing light-emitting diodes, solar cell devices, actuators, biosensors, and micro electro mechanical systems. The newly plantbased resist material derived from biomass is expected as one of the nanoimprint lithography technology in next generation optical devices and biosensors.

Paper Details

Date Published: 8 May 2012
PDF: 7 pages
Proc. SPIE 8428, Micro-Optics 2012, 84281U (8 May 2012); doi: 10.1117/12.924636
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 8428:
Micro-Optics 2012
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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