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Proceedings Paper

Adaptive filtering with organic photorefractive materials via four-wave mixing
Author(s): Jed Khoury; John Donoghue; Bahareh Haji-saeed; Charles L. Woods; John Kierstead; Nasser Peyghambarian; Michiharu Yamamoto
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Paper Abstract

In prior work, we exploited the nonlinearity inherent in four-wave mixing in organic photorefractive materials for adaptive filtering. In this paper, we extend our work further and demonstrate new applications which involve: dislocation, scratches and defect enhancement. With the availability of the organic photorefractive materials with large space-bandwidth product, it should open the possibility of using the adaptive filtering techniques in quality control systems.

Paper Details

Date Published: 23 April 2012
PDF: 12 pages
Proc. SPIE 8398, Optical Pattern Recognition XXIII, 83980F (23 April 2012); doi: 10.1117/12.923369
Show Author Affiliations
Jed Khoury, Air Force Research Lab. (United States)
John Donoghue, Solid State Scientific Corp. (United States)
Bahareh Haji-saeed, Air Force Research Lab. (United States)
Charles L. Woods, Air Force Research Lab. (United States)
John Kierstead, Solid State Scientific Corp. (United States)
Nasser Peyghambarian, College of Optical Sciences, The Univ. of Arizona (United States)
Michiharu Yamamoto, Nitto Denko Technical Corp. (United States)

Published in SPIE Proceedings Vol. 8398:
Optical Pattern Recognition XXIII
David P. Casasent; Tien-Hsin Chao, Editor(s)

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