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Proceedings Paper

Mask readiness for EUVL pilot line
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Paper Abstract

EUVL pilot line will be launched in 2012 with several pre-production tools installed in world wide. Since there will be still the productivity issue on the exposure tool, certain demand of EUV masks may be required in 2012. In this presentation, the status of EUV mask readiness, such as pattern quality, related infrastructures, and mask handling flow etc., will be discussed.

Paper Details

Date Published: 16 April 2012
PDF: 5 pages
Proc. SPIE 8352, 28th European Mask and Lithography Conference, 835204 (16 April 2012); doi: 10.1117/12.923125
Show Author Affiliations
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)
Tsukasa Abe, Dai Nippon Printing Co., Ltd. (Japan)
Tadahiko Takikawa, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 8352:
28th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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