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Proceedings Paper

Recent developments in the NPDD model
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Paper Abstract

An understanding of the photochemical and photo-physical processes, which occur during photo-polymerization, is of extreme importance when attempting to improve a photopolymer material's performance for a given application. Recent work carried out on the modeling of photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behavior of a number of photopolymers subject to a range of physical conditions. In this paper, we explore the most recent developments made to the Non-local Photo-polymerization Driven Diffusion model, and illustrate some of the useful trends, which the model predicts and then analyze their implications on photopolymer improvement.

Paper Details

Date Published: 27 April 2012
PDF: 12 pages
Proc. SPIE 8429, Optical Modelling and Design II, 84291C (27 April 2012); doi: 10.1117/12.922643
Show Author Affiliations
Michael R. Gleeson, National Univ. of Ireland, Maynooth (Ireland)
Jinxin Guo, Univ. College Dublin (Ireland)
John T. Sheridan, Univ. College Dublin (Ireland)

Published in SPIE Proceedings Vol. 8429:
Optical Modelling and Design II
Frank Wyrowski; John T. Sheridan; Jani Tervo; Youri Meuret, Editor(s)

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