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Proceedings Paper

Low-loss single mode light waveguides in polymer
Author(s): Heinrich Sieber; Hans-Jürgen Boehm; Uwe Hollenbach; Jürgen Mohr; Ute Ostrzinski; Karl Pfeiffer; Marcin Szczurowski; Waclaw Urbanczyk
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Paper Abstract

We report on the development of a UV-lithography manufacturing process for low loss single mode light waveguides in a novel polymer and the characterization of the fabricated components in a broad wavelength range from 808 nm to 1550 nm. The main focus of this work lies in providing a quick and cost efficient production technique for single mode waveguides and low loss integrated optical circuits. To achieve this goal we chose a novel photo-structurable polymer host-guest-system consisting of SU8 and a low refractive dopant monomer. Near and far-field measurements at different wavelengths show that the mode propagating within a well designed integrated waveguide structure and the mode of a standard fiber can exhibit a mode overlap value of approximately 1 and suffer only very low coupling losses. We demonstrate excess loss of 0.14 dB/cm for 808 nm, 0.33 dB/cm for 1310 nm and 2.86 dB/cm for 1550 nm. Typical insertion loss values of straight waveguides with a length of 36 mm are 0.9 dB for 808 nm, 1.5 dB for 1310 nm and 10.4 dB for 1550 nm. Polarization dependent loss was found to be less than 0.2 dB on sets of test structures of 36 mm length. We measured material attenuation in the novel polymer material before cross-linking of approximately 0.04 dB/cm for 808 nm and around 0.20 dB/cm for 1310 nm respectively. The presented production technique is suitable to provide low loss and low cost integrated optical circuits for sensor and communication applications in a broad wavelength range.

Paper Details

Date Published: 10 May 2012
PDF: 10 pages
Proc. SPIE 8431, Silicon Photonics and Photonic Integrated Circuits III, 84311R (10 May 2012); doi: 10.1117/12.922567
Show Author Affiliations
Heinrich Sieber, Karlsruhe Institute of Technology (Germany)
Hans-Jürgen Boehm, Karlsruhe Institute of Technology (Germany)
Uwe Hollenbach, Karlsruhe Institute of Technology (Germany)
Jürgen Mohr, Karlsruhe Institute of Technology (Germany)
Ute Ostrzinski, micro resist technology GmbH (Germany)
Karl Pfeiffer, micro resist technology GmbH (Germany)
Marcin Szczurowski, Wroclaw Univ. of Technology (Poland)
Waclaw Urbanczyk, Wroclaw Univ. of Technology (Poland)

Published in SPIE Proceedings Vol. 8431:
Silicon Photonics and Photonic Integrated Circuits III
Laurent Vivien; Seppo K. Honkanen; Lorenzo Pavesi; Stefano Pelli, Editor(s)

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