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Proceedings Paper

A comparison between PECVD and ALD for the fabrication of slot-waveguide-based sensors
Author(s): Grégory Pandraud; Agung Purniawan; Eduardo Margallo-Balbás; Pasqualina M. Sarro
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Paper Abstract

We fabricated horizontal slot waveguides using two low temperature deposition techniques ensuring the full compatibility of the processes with CMOS technology. Slots width as thin as 45 nm with smooth slot surfaces can easily be fabricated with simple photolithographic steps. Fundamental TM-like slot mode in which the E-field is greatly enhanced within slot showed a 23.9 dB/cm and a 18 dB/cm in a PECVD SiC/SiO2/SiC and a ALD TiO2/Al2O3/TiO2 vertical slot waveguide, respectively.

Paper Details

Date Published: 1 May 2012
PDF: 7 pages
Proc. SPIE 8424, Nanophotonics IV, 84242P (1 May 2012); doi: 10.1117/12.922400
Show Author Affiliations
Grégory Pandraud, Technische Univ. Delft (Netherlands)
Agung Purniawan, Technische Univ. Delft (Netherlands)
Eduardo Margallo-Balbás, MedLumics S.L. (Spain)
Pasqualina M. Sarro, Technische Univ. Delft (Netherlands)


Published in SPIE Proceedings Vol. 8424:
Nanophotonics IV
David L. Andrews; Jean-Michel Nunzi; Andreas Ostendorf, Editor(s)

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