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Proceedings Paper

Using UV-based nanoimprint lithography to fabricate single and multilayer negative index materials
Author(s): Iris Bergmair; Babak Dastmalchi; Michael Bergmair; Günter Hesser; g bruno; Maria Losurdo; C. Helgert; E. Pshenay-Severin; T. Pertsch; E.-B. Kley; U. Hübner; Kurt Hingerl; Michael Mühlberger
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Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520L; doi: 10.1117/12.921326
Show Author Affiliations
Iris Bergmair, Profactor GmbH (Austria)
Babak Dastmalchi, Johannes Kepler Univ. Linz (Austria)
Michael Bergmair, Johannes Kepler Univ. Linz (Austria)
Günter Hesser
g bruno
Maria Losurdo
C. Helgert
E. Pshenay-Severin
T. Pertsch
E.-B. Kley
U. Hübner
Kurt Hingerl
Michael Mühlberger, Profactor GmbH (Austria)


Published in SPIE Proceedings Vol. 8352:
28th European Mask and Lithography Conference

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