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Proceedings Paper

PSM and thin OMOG reticles aerial imaging metrology comparison study
Author(s): Yaron Cohen; Jo Finders; Shmoolik Mangan; Ilan Englard; Orion Mouraille; Maurice Janssen; Junji Miyazaki; Brid Connolly; Yosuke Kojima; Masaru Higuchi
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Paper Abstract

For sub 20nm features, IC (integrated circuits) designs include an increasing number of features approaching the resolution limits of the scanner compared to the previous generation of IC designs. This trend includes stringent design rules and complex, ever smaller optical proximity correction (OPC) structures. In this regime, a new type of mask, known as opaque MoSi on glass (OMOG), has been introduced to overcome the shortcomings of the well-established phase shift masks (PSM). This paper reviews the fundamental aerial imaging differences between identically designed PSM and thin OMOG masks. The masks were designed for scanner qualification tests and therefore contain large selections of 1D and 2D features, including various biases and OPCs. Aerial critical dimension uniformity (CDU) performance for various features on both masks are reported. Furthermore, special efforts have been made to emphasize the advantages of aerial imaging metrology versus wafer metrology in terms of shortening scanner qualification cycle time.

Paper Details

Date Published: 16 April 2012
PDF: 12 pages
Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520H (16 April 2012); doi: 10.1117/12.919791
Show Author Affiliations
Yaron Cohen, Applied Materials, Inc. (Israel)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Shmoolik Mangan, Applied Materials, Inc. (Israel)
Ilan Englard, Applied Materials B.V. (Netherlands)
Orion Mouraille, ASML Netherlands B.V. (Netherlands)
Maurice Janssen, ASML Netherlands B.V. (Netherlands)
Junji Miyazaki, ASML Japan Co., Ltd. (Japan)
Brid Connolly, Toppan Photomasks, Inc. (Germany)
Yosuke Kojima, Toppan Printing Co., Ltd. (Japan)
Masaru Higuchi, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 8352:
28th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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