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Proceedings Paper

Fabrication of near- or mid-infrared wire-grid polarizers with WSi wires
Author(s): Itsunari Yamada; Kohei Fukumi; Junji Nishii; Mitsunori Saito
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Paper Abstract

We fabricated a subwavelength-grating structure on the Y2O3 ceramic substrate, which has higher transparency than silicon in the mid-infrared range. After coating a photoresist on this substrate, we formed a grating pattern of 350-nm pitch by the two-beam interference of the He-Cd laser (325-nm wavelength). By using this photoresist grating as a mask, WSi was etched with reactive SF6 ions. The transmittance of the transverse magnetic (TM) polarization was greater than 70% in the 3-7-μm wavelength range without antireflection films and the extinction ratio was over 20 dB in the 2.5-5-μm wavelength range. In addition, we also fabricated near-infrared wire-grid polarizer consisting of a 230-nm pitch WSi grating on a SiO2 substrate. The TM polarization transmittance of the fabricated polarizer exceeded 80% in the 1000-1600-nm wavelength range. The extinction ratio was higher than 20 dB in the 650-1500-nm wavelength range.

Paper Details

Date Published: 8 May 2012
PDF: 9 pages
Proc. SPIE 8428, Micro-Optics 2012, 84281A (8 May 2012); doi: 10.1117/12.919758
Show Author Affiliations
Itsunari Yamada, The Univ. of Shiga Prefecture (Japan)
Kohei Fukumi, National Institute of Advanced Industrial Science and Technology (Japan)
Junji Nishii, Hokkaido Univ. (Japan)
Mitsunori Saito, Ryukoku Univ. (Japan)

Published in SPIE Proceedings Vol. 8428:
Micro-Optics 2012
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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