Share Email Print
cover

Proceedings Paper

Optical performance of LPP multilayer collector mirrors
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The usable power and the collector optics lifetime of high-power extreme ultraviolet light sources at 13.5 nm are considered as the major challenges in the transitioning of EUV lithography from the current pre-production phase to high volume manufacturing. We give a detailed performance summary of the large ellipsoidal multilayer collector mirrors used in Cymer's laser-produced plasma extreme ultraviolet light sources. In this paper we present the optical performance - reflectance and wavelength - of the multilayer-coated ellipsoidal collectors as well as a novel approach for the roughness characterization of large EUV mirror optics based on light scattering measurements at 442 nm. We also describe the optical performance and characteristics during operation of the light source and the substantial increase of collector lifetime by the implementation of new coating designs.

Paper Details

Date Published: 23 March 2012
PDF: 8 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832217 (23 March 2012); doi: 10.1117/12.919735
Show Author Affiliations
Torsten Feigl, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Marco Perske, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Hagen Pauer, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Tobias Fiedler, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Sergiy Yulin, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Marcus Trost, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Sven Schröder, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Angela Duparré, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Andreas Tünnermann, Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)
Norbert R. Böwering, Cymer, Inc. (United States)
Alex I. Ershov, Cymer, Inc. (United States)
Kay Hoffmann, Cymer, Inc. (United States)
Bruno La Fontaine, Cymer, Inc. (United States)
Kevin D. Cummings, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

© SPIE. Terms of Use
Back to Top