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Proceedings Paper

Developing particle detection test bench for vacuum components
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Paper Abstract

Extreme ultraviolet (EUV) lithography is the leading contender for adoption as the next generation lithography technique. One of the critical challenges in this technology is producing defect-free masks. Particles generated in the fabrication process often deposit on the mask blank and result in phase and amplitude defects. Hence, it is important to study the transport, behavior and generation of particles in the ion deposition tool used for mask blank deposition. We show results on detecting particles from ultrahigh vacuum (UHV) valves by using optical counters and condensation particle counters. The particles were also trapped using impactor plates and analyzed with Energy-dispersive x-ray spectroscopy (EDX) for elemental composition.

Paper Details

Date Published: 23 March 2012
PDF: 7 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832225 (23 March 2012); doi: 10.1117/12.919689
Show Author Affiliations
Yashdeep Khopkar, Univ. at Albany (United States)
Henry Herbol, Univ. at Albany (United States)
Mihir Upadhyaya, Univ. at Albany (United States)
Gregory Denbeaux, Univ. at Albany (United States)
Vibhu Jindal, SEMATECH North (United States)
Patrick Kearney, SEMATECH North (United States)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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