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Proceedings Paper

25nm pitch master and replica mold fabrication for nanoimprinting lithography for 1Tbit/inch2 bit patterned media
Author(s): Hideo Kobayashi; Shuji Kishimoto; Kouta Suzuki; Hiromasa Iyama; Sakae Nakatsuka; Kazutake Taniguchi; Takashi Sato; Tsuyoshi Watanabe
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Paper Abstract

Nanoimprint Lithography and a mold, mold replication from an EB master mold as well, those are essential for a large-scale production of bit patterned media. 1Tbit/inch2 (bit pitch 25nm) areal density on a 2.5inch HDD media, it is feasibility demonstration target all the media makers and the HDD makers are aiming at. This paper describes difficulties we faced, and solutions we established by designing and optimizing materials and process, to fabricate 25nm pitch master mold by EBL as well as working replica mold by NIL.

Paper Details

Date Published: 21 March 2012
PDF: 12 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231V (21 March 2012); doi: 10.1117/12.918664
Show Author Affiliations
Hideo Kobayashi, HOYA Corp. (Japan)
Shuji Kishimoto, HOYA Corp. (Japan)
Kouta Suzuki, HOYA Corp. (Japan)
Hiromasa Iyama, HOYA Corp. (Japan)
Sakae Nakatsuka, HOYA Corp. (Japan)
Kazutake Taniguchi, HOYA Corp. (Japan)
Takashi Sato, HOYA Corp. (Japan)
Tsuyoshi Watanabe, HOYA Corp. (Japan)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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