Share Email Print
cover

Proceedings Paper

Ion energy spectrum and magnetic foil trap debris mitigation efficiency of the laser produced plasma sources for extreme ultraviolet lithography
Author(s): Tao Wu; Shifang Wang; Zhiming Rao
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Based on the energy spectrum and maximum kinetic energy of accelerated ions, an analytical model was developed to calculate the magnetic foil trap mitigation efficiency of ion debris emitted from droplet-based laser-produced mass-limited plasmas for an application to extreme ultraviolet (EUV) lithography. The effects of magnetic field intensity, foil structures on the mitigation efficiency of different ionization state ions were investigated in order to establish the guideline for the optimum design of a mitigation system. The calculation results show that the foil trap mitigation efficiency η is calculated in the range of 92%~78% for a foil angle of 0.03 rad and foil length of 10 cm under magnetic field of B=0.1 T, which for the case of laser power densities and droplet target radius in the range suitable for extreme ultraviolet light source for lithography.

Paper Details

Date Published: 13 March 2012
PDF: 8 pages
Proc. SPIE 8330, Photonics and Optoelectronics Meetings (POEM) 2011: Laser and Terahertz Science and Technology, 83300O (13 March 2012); doi: 10.1117/12.918317
Show Author Affiliations
Tao Wu, Wuhan Institute of Technology (China)
Huazhong Univ. of Science and Technology (China)
Shifang Wang, Hubei Univ. of Education (China)
Zhiming Rao, Jiangxi Univ. of Traditional Chinese Medicine (China)


Published in SPIE Proceedings Vol. 8330:
Photonics and Optoelectronics Meetings (POEM) 2011: Laser and Terahertz Science and Technology
Jianquan Yao; X. C. Zhang; Dapeng Yan; Jinsong Liu, Editor(s)

© SPIE. Terms of Use
Back to Top