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Proceedings Paper

Automated SEM recipe generation for OPC applications
Author(s): Sylvain Berthiaume; Travis Brist; Peter Brooker; William Stanton; Brian Ward; Shimon Levi; Amit Siany
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Paper Abstract

This work presents software tools that enable engineers to make relevant SEM measurement decisions in the EDA environment, presented in the optimal context for the engineer, and pass them seamlessly into the SEM environment. We present the tools and interfaces leveraged in this solution and explore the benefits of enabling OPC modeling engineers to make metrology-related decisions within the OPC environment. New opportunities for automation of metrologyrelated OPC tasks are also discussed.

Paper Details

Date Published: 5 April 2012
PDF: 12 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83241W (5 April 2012); doi: 10.1117/12.918083
Show Author Affiliations
Sylvain Berthiaume, Synopsys, Inc. (Canada)
Travis Brist, Synopsys, Inc. (United States)
Peter Brooker, Synopsys, Inc. (United States)
William Stanton, Synopsys, Inc. (United States)
Brian Ward, Synopsys, Inc. (United States)
Shimon Levi, Applied Materials (Israel)
Amit Siany, Applied Materials (Israel)

Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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