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Simulation study of LWR bounding of depth of focus of various lithographic techniques: interference, optical projection, EUV, e-beam and hybrid complementary lithography, and proposal for a new production interference tool
Author(s): John S. Petersen
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Proc. SPIE 8326, Optical Microlithography XXV, 83260S; doi: 10.1117/12.918074
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John S. Petersen, Periodic Structures, Inc. (United States)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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