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Proceedings Paper

Computational lithography work flows and design rule exploration automation
Author(s): S. Sethi; William Stanton; Kevin Lucas; Jay Hiserote; Duck-Hyung Hur; Rooli Choi
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Paper Abstract

Lithography development has become extremely computationally intensive. For a particular technology node being developed, it is critical to determine the optimum source and OPC/RET for each layer. In this paper we present a flexible new computation system for automation of source, OPC and RET optimization of advanced lithography layers. Of course, before determining the optimum source/RET/OPC of any layer, it is equally critical to determine the design rules which can be manufactured at a particular technology node. The design rule computational lithography problem is a superset of the source/OPC/RET optimization problem. With an automated methodology, time for process development can be reduced dramatically if a process development engineer can determine the design rules through accurate, automated simulation of the entire flow.

Paper Details

Date Published: 14 March 2012
PDF: 13 pages
Proc. SPIE 8327, Design for Manufacturability through Design-Process Integration VI, 83270O (14 March 2012); doi: 10.1117/12.918057
Show Author Affiliations
S. Sethi, Synopsys, Inc. (United States)
William Stanton, Synopsys, Inc. (United States)
Kevin Lucas, Synopsys, Inc. (United States)
Jay Hiserote, Synopsys, Inc. (United States)
Duck-Hyung Hur, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Rooli Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

Published in SPIE Proceedings Vol. 8327:
Design for Manufacturability through Design-Process Integration VI
Mark E. Mason, Editor(s)

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