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Proceedings Paper

Wavelength selection for multilayer coatings for the lithography generation beyond EUVL
Author(s): Igor A. Makhotkin; Erwin Zoethout; Eric Louis; Andrei M. Yakunin; Stephan Müllender; Fred Bijkerk
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Paper Abstract

The spectral properties of LaN/B and LaN/B4C multilayer mirrors have been investigated in the 6.5-6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal single mirror reflectance for boron based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B4C multilayer system is confirmed experimentally. Calculations of the wavelengthintegrated reflectance for ideal 10-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.

Paper Details

Date Published: 22 March 2012
PDF: 5 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832213 (22 March 2012); doi: 10.1117/12.918036
Show Author Affiliations
Igor A. Makhotkin, FOM Institute DIFFER (Netherlands)
Erwin Zoethout, FOM Institute DIFFER (Netherlands)
Eric Louis, FOM Institute DIFFER (Netherlands)
Andrei M. Yakunin, ASML Netherlands B.V. (Netherlands)
Stephan Müllender, Carl Zeiss SMT GmbH (Germany)
Fred Bijkerk, FOM Institute DIFFER (Netherlands)
Univ. Twente (Netherlands)


Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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