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Proceedings Paper

Impact of reticle absorber on the imaging properties in ArFi lithography
Author(s): Jo Finders; O. Mouraille; A. Bouma; A. Ngai; K. Grim; J. van Praagh; C. Toma; J. Miyazaki; M. Higuchi; Y. Kojima; B. Connolly; I. Englard; Y. Cohen; S. Mangan; Michael Ben Yishai; Karine Jullian
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Paper Abstract

In this paper we compare the imaging properties of lithographic test structures formed on test masks with different reticle absorbers for use in1.35 NA immersion lithography. We will look into different aspects like process windows and CD fingerprints. Beyond that we look into the topographic effects caused by the different absorbers, the mask 3D effects. We will study the interaction between the different masks and immersion scanner. Special attention is given towards the correctability of the intrafield CD fingerprint by mask and scanner applying dose corrections.

Paper Details

Date Published: 16 April 2012
PDF: 15 pages
Proc. SPIE 8352, 28th European Mask and Lithography Conference, 83520G (16 April 2012); doi: 10.1117/12.918018
Show Author Affiliations
Jo Finders, ASML Netherlands B.V. (Netherlands)
O. Mouraille, ASML Netherlands B.V. (Netherlands)
A. Bouma, ASML Netherlands B.V. (Netherlands)
A. Ngai, ASML Netherlands B.V. (Netherlands)
K. Grim, ASML Netherlands B.V. (Netherlands)
J. van Praagh, ASML Netherlands B.V. (Netherlands)
C. Toma, ASML Netherlands B.V. (Netherlands)
J. Miyazaki, ASML Japan Co., Ltd. (Japan)
M. Higuchi, Toppan Printing Co., Ltd. (Japan)
Y. Kojima, Toppan Printing Co., Ltd. (Japan)
B. Connolly, Toppan Photomasks, Inc. (Germany)
I. Englard, Applied Materials, Inc. (Israel)
Y. Cohen, Applied Materials, Inc. (Israel)
S. Mangan, Applied Materials, Inc. (Israel)
Michael Ben Yishai, Applied Materials, Inc. (Israel)
Karine Jullian, STMicroelectronics (France)

Published in SPIE Proceedings Vol. 8352:
28th European Mask and Lithography Conference
Uwe F.W. Behringer; Wilhelm Maurer, Editor(s)

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