Share Email Print

Proceedings Paper

Directed self-assembly defectivity assessment. Part II
Author(s): Chris Bencher; He Yi; Jessica Zhou; Manping Cai; Jeffrey Smith; Liyan Miao; Ofir Montal; Shiran Blitshtein; Alon Lavi; Kfir Dotan; Huixiong Dai; Joy Y. Cheng; Daniel P. Sanders; Melia Tjio; Steven Holmes
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The main concern for the commercialization of directed self-assembly (DSA) for semiconductor manufacturing continues to be the uncertainty in capability and control of defect density. Our research investigates the defect densities of various DSA process applications in the context of a 300mm wafer fab cleanroom environment; this paper expands substantially on the previously published DSA defectivity study by reporting a defect density process window relative to chemical epitaxial pre-pattern registration lines; as well as investigated DSA based contact hole shrinking and report critical dimension statistics for the phase separated polymers before and after etch, along with positional accuracy measurements and missing via defect density.

Paper Details

Date Published: 16 April 2012
PDF: 10 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230N (16 April 2012); doi: 10.1117/12.917993
Show Author Affiliations
Chris Bencher, Applied Materials, Inc. (United States)
He Yi, Applied Materials, Inc. (United States)
Jessica Zhou, Applied Materials, Inc. (United States)
Manping Cai, Applied Materials, Inc. (United States)
Jeffrey Smith, Applied Materials, Inc. (United States)
Liyan Miao, Applied Materials, Inc. (United States)
Ofir Montal, Applied Materials, Inc. (Israel)
Shiran Blitshtein, Applied Materials, Inc. (Israel)
Alon Lavi, Applied Materials, Inc. (Israel)
Kfir Dotan, Applied Materials, Inc. (United States)
Huixiong Dai, Applied Materials, Inc. (United States)
Joy Y. Cheng, IBM Almaden Research Ctr. (United States)
Daniel P. Sanders, IBM Almaden Research Ctr. (United States)
Melia Tjio, IBM Almaden Research Ctr. (United States)
Steven Holmes, IBM Albany Nanotech (United States)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

© SPIE. Terms of Use
Back to Top