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Proceedings Paper

Scalable simulations for directed self-assembly patterning with the use of GPU parallel computing
Author(s): Kenji Yoshimoto; Brandon L. Peters; Gurdaman S. Khaira; Juan J. de Pablo
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Paper Abstract

Directed self-assembly (DSA) patterning has been increasingly investigated as an alternative lithographic process for future technology nodes. One of the critical specs for DSA patterning is defects generated through annealing process or by roughness of pre-patterned structure. Due to their high sensitivity to the process and wafer conditions, however, characterization of those defects still remain challenging. DSA simulations can be a powerful tool to predict the formation of the DSA defects. In this work, we propose a new method to perform parallel computing of DSA Monte Carlo (MC) simulations. A consumer graphics card was used to access its hundreds of processing units for parallel computing. By partitioning the simulation system into non-interacting domains, we were able to run MC trial moves in parallel on multiple graphics-processing units (GPUs). Our results show a significant improvement in computational performance.

Paper Details

Date Published: 21 March 2012
PDF: 11 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83232P (21 March 2012); doi: 10.1117/12.917830
Show Author Affiliations
Kenji Yoshimoto, GLOBALFOUNDRIES Inc. (United States)
Brandon L. Peters, Univ. of Wisconsin-Madison (United States)
Gurdaman S. Khaira, Univ. of Wisconsin-Madison (United States)
Juan J. de Pablo, Univ. of Wisconsin-Madison (United States)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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