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Proceedings Paper

Synthesis of stable acid amplifiers that produce strong highly-fluorinated polymer-bound acid
Author(s): Kenji Hosoi; Brian Cardineau; William Earley; Seth Kruger; Koichi Miyauchi; Robert Brainard
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Paper Abstract

A novel series of stable, acid amplifiers (AAs) has been designed and tested for use in Extreme Ultraviolet (EUV) lithography, that generate strong, fluorinated polymer bound sulfonic acids. Novel polymer bound and blended AAs were prepared in moderate to good yields and characterized by NMR. We demonstrated by EUV lithography that the polymer bound AA resist has line-edge roughness (LER) values of 3.8 nm and the polymer blended AA resist has LER values of 2.1 nm while the control resist has LER values of 4.6 nm. Although sensitivity comparisons have yet to be made, these new resists using bound and blended AAs are showing remarkable improvements in LER when compared with the control resist without AAs.

Paper Details

Date Published: 20 March 2012
PDF: 7 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251S (20 March 2012); doi: 10.1117/12.917018
Show Author Affiliations
Kenji Hosoi, Central Glass Co., Ltd. (Japan)
Brian Cardineau, College of Nanoscale Science & Engineering, Univ. at Albany (United States)
William Earley, College of Nanoscale Science & Engineering, Univ. at Albany (United States)
Seth Kruger, College of Nanoscale Science & Engineering, Univ. at Albany (United States)
Koichi Miyauchi, Central Glass Co., Ltd. (Japan)
Robert Brainard, College of Nanoscale Science & Engineering, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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