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Proceedings Paper

Stable, fluorinated acid amplifiers for use in EUV lithography
Author(s): Seth Kruger; Kenji Hosoi; Brian Cardineau; Koichi Miyauchi; Robert Brainard
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Paper Abstract

This paper presents two new concepts that together provide a 100,000X improvement in stability for AAs that produce highly-fluorinated, strong sulfonic acids. These two new design concepts are based on (1) an olefin-trigger structure and (2) a trifluoromethyl group alpha to the sulfonic ester. These new concepts led to the synthesis of the first stable acid amplifier that generates triflate acid and for the synthesis of AAs that are stable enough to be used as monomers in free-radical polymerization reactions yet produce very strong, fluorinated acids. Lastly, we present preliminary results where one new AA is able to improve the LER of a control resist from 4.6 ± 0.5 nm to 2.1 ± 0.1 nm.

Paper Details

Date Published: 20 March 2012
PDF: 13 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 832514 (20 March 2012); doi: 10.1117/12.917015
Show Author Affiliations
Seth Kruger, College of Nanoscale Science and Engineering, Univ. at Albany (United States)
Kenji Hosoi, Central Glass Co., Ltd. (Japan)
Brian Cardineau, College of Nanoscale Science and Engineering, Univ. at Albany (United States)
Koichi Miyauchi, Central Glass Co., Ltd. (Japan)
Robert Brainard, College of Nanoscale Science and Engineering, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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