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Proceedings Paper

Tightly bound ligands for hafnium nanoparticle EUV resists
Author(s): Brian Cardineau; Marie Krysak; Markos Trikeriotis; Emmanuel Giannelis; Christopher K. Ober; Kyoungyong Cho; Robert Brainard
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Paper Abstract

Relative ligand binding energies were determined for a series of common ligand types with hafnium oxide nanoparticles, and from these results a series of novel strong binding ligands were developed. The relative equilibrium concentrations of two competing ligands bound to the nanoparticles were measured using nuclear magnetic resonance spectroscopy (NMR). For each ligand type, equilibrium constants and relative binding energies were then calculated and compared. Methane sulfonic acid was found to have the strongest binding energy, 2.0 Kcal/mol stronger than acetic acid. A group of three sulfonate ligands capable of freeradical crosslinking were made, along with three sulfonate ligands capable of creating aqueous developable nanoparticles. One of these ligands resulted in insoluble nanoparticles, however, the other two ligands resulted in nanoparticles that coated well on a silicon substrate and had dissolution rates greater than 100 nm per second.

Paper Details

Date Published: 22 March 2012
PDF: 10 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83220V (22 March 2012); doi: 10.1117/12.917014
Show Author Affiliations
Brian Cardineau, Univ. at Albany (United States)
Marie Krysak, Cornell Univ. (United States)
Markos Trikeriotis, Cornell Univ. (United States)
Emmanuel Giannelis, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)
Kyoungyong Cho, SEMATECH North (United States)
Robert Brainard, Univ. at Albany (United States)

Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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