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Proceedings Paper

High-numerical-aperture focused field measurement system based on a confocal microscopy
Author(s): Zhehai Zhou; Qiaofeng Tan
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Paper Abstract

A high-numerical-aperture (NA) focused field measurement system based on a confocal microscopy is presented, and its basic structure and operation theory are introduced in details. In order to evaluate the reliability and efficiency of the measurement system, the focused field intensity distributions of several types of beams, including linearly polarized beams, radially polarized beams, azimuthally polarized beams and radially polarized vortex beams are measured while the NA of the focused objective lens is 0.90, and the Measured results agree with the calculated results. In addition, some methods are also proposed to improve the measurement accuracy at last.

Paper Details

Date Published: 15 November 2011
PDF: 6 pages
Proc. SPIE 8321, Seventh International Symposium on Precision Engineering Measurements and Instrumentation, 832146 (15 November 2011); doi: 10.1117/12.916884
Show Author Affiliations
Zhehai Zhou, Beijing Information Science and Technology Univ. (China)
Tsinghua Univ. (China)
Qiaofeng Tan, Tsinghua Univ. (China)


Published in SPIE Proceedings Vol. 8321:
Seventh International Symposium on Precision Engineering Measurements and Instrumentation
Kuang-Chao Fan; Man Song; Rong-Sheng Lu, Editor(s)

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