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Proceedings Paper

EUVL compatible LER solutions using functional block copolymers
Author(s): Han-Hao Cheng; Imelda Keen; Anguang Yu; Ya-Mi Chuang; Idriss Blakey; Kevin S. Jack; Michael J. Leeson; Todd R. Younkin; Andrew K. Whittaker
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Paper Abstract

Directed self assembly (DSA) of block copolymers is an emerging technology for achieving sub-lithographic resolution. We investigate the directed self assembly of two systems, polystyrene-block-poly-DL-lactic acid (PS-b-PDLA) and PSb- poly(methyl methacrylate). For the PS-b-PDLA system we use an open source EUVL resist and a commerciallyavailable underlayer to prepare templates for DSA. We investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PDLA interface. For the PS-b-PMMA system we again use an open source resist, but the annealing conditions in this case require crosslinking of the resist prior to deposition of the block copolymer. For this system we also investigate the morphology of the phase separated domains and compare the LER of the resist and the PS-PMMA interface.

Paper Details

Date Published: 21 March 2012
PDF: 11 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231O (21 March 2012); doi: 10.1117/12.916744
Show Author Affiliations
Han-Hao Cheng, The Univ. of Queensland (Australia)
Imelda Keen, The Univ. of Queensland (Australia)
Anguang Yu, The Univ. of Queensland (Australia)
Ya-Mi Chuang, The Univ. of Queensland (Australia)
Idriss Blakey, The Univ. of Queensland (Australia)
Kevin S. Jack, The Univ. of Queensland (Australia)
Michael J. Leeson, Intel Corp. (United States)
Todd R. Younkin, Intel Corp. (United States)
Andrew K. Whittaker, The Univ. of Queensland (Australia)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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