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The study of synthesis and photocuring behaviors of organic silicon modified methylacrylate and acrylate
Author(s): Si-yuan Wang; Ying-quan Zou
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Paper Abstract

Ten different silicon-containing methyl acrylate and acrylate monomers were synthesized by the substitution reaction of chlorosilanes or chlorosiloxanes with 2-Hydroxyethyl methacrylate or 2-Hydroxyethyl acrylate. Using triethylamine as the catalytic agent, tetrahydrofuran as the solvent, pure products can be obtained with one-step reaction after reduced pressure distillation or column chromatography via controlling raw ratio and reaction time. In this study, one to four silicon contained methyl acrylate and acrylate monomers were synthesized with simple methd and high yield. Monomers' properties were characterized through IR, 1H-NMR, 13C-NMR and their viscosity and thermostability were also characterized. The polymers' have good performance on UV-curing and low surface energy.

Paper Details

Date Published: 23 March 2012
PDF: 7 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222G (23 March 2012); doi: 10.1117/12.916673
Show Author Affiliations
Si-yuan Wang, Beijing Normal Univ. (China)
Ying-quan Zou, Beijing Normal Univ. (China)

Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood, Editor(s)

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