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Proceedings Paper

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
Author(s): Lei Wan; Ricardo Ruiz; He Gao; Kanaiyalal C. Patel; Jeffery Lille; Gabriel Zeltzer; Elizabeth A. Dobisz; Alexei Bogdanov; Paul F. Nealey; Thomas R. Albrecht
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Paper Abstract

We combine block copolymer directed self-assembly with nanoimprint lithography to generate templates with rectangular patterns through an original double imprint process. We use a rotary e-beam tool to separately expose circumferential and radial line/space chemical contrast patterns with periodicities commensurate to the natural period of two lamellae-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) block copolymers. Line patterns are formed by directed self-assembly of PS-b-PMMA on chemical patterns on two separate submaster templates, one with circumferential lines to define concentric tracks, and a second template on which the block copolymer is used to form radial lines at constant angular pitch. The patterns are subsequently transferred to their underlying Si substrates to form submaster templates. Using two sequential nanoimprinting steps, we combine the radial and circumferential submaster line patterns into a final quartz master template with rectangular bits on circular tracks.

Paper Details

Date Published: 21 March 2012
PDF: 14 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832319 (21 March 2012); doi: 10.1117/12.916592
Show Author Affiliations
Lei Wan, Hitachi Global Storage Technologies, Inc. (United States)
Univ. of Wisconsin-Madison (United States)
Ricardo Ruiz, Hitachi Global Storage Technologies, Inc. (United States)
He Gao, Hitachi Global Storage Technologies, Inc. (United States)
Kanaiyalal C. Patel, Hitachi Global Storage Technologies, Inc. (United States)
Jeffery Lille, Hitachi Global Storage Technologies, Inc. (United States)
Gabriel Zeltzer, Hitachi Global Storage Technologies, Inc. (United States)
Elizabeth A. Dobisz, Hitachi Global Storage Technologies, Inc. (United States)
Alexei Bogdanov, Hitachi Global Storage Technologies, Inc. (United States)
Paul F. Nealey, Univ. of Wisconsin-Madison (United States)
Thomas R. Albrecht, Hitachi Global Storage Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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