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Proceedings Paper

Imaging optics setup and optimization on scanner for SMO generation process
Author(s): Tomoyuki Matsuyama; Taro Ogata; Yasushi Mizuno; Yasuhiro Ohmura
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Paper Abstract

Source & Mask Optimization1 (SMO) is a promising candidate to realize further reduction of k1 factor to achieve 22nm feature lithography and beyond. To make the SMO solutions feasible all imaging-related parameters should be closer to the designed parameters used in SMO process. In this paper, we discuss how we realize this in the imaging system setup on the scanner. The setup process includes freeform pupilgram generation, pupilgram adjustment and thermal aberration control. For each step the important factors are speed and accuracy.

Paper Details

Date Published: 13 March 2012
PDF: 10 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83260N (13 March 2012); doi: 10.1117/12.916588
Show Author Affiliations
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Taro Ogata, Nikon Corp. (Japan)
Yasushi Mizuno, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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