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Proceedings Paper

Sub-100 nm pattern formation by roll-to-roll nanoimprint
Author(s): Ryoichi Inanami; Tomoko Ojima; Kazuto Matsuki; Takuya Kono; Tetsuro Nakasugi
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Paper Abstract

Technologies for pattern fabrication on a flexible substrate are being developed for various flexible devices. A patterning technique for a smaller pattern of the order of sub-100 nm will be needed in the near future. Roll-to-roll Nano-Imprint Lithography (RtR-NIL) is promising candidate for extremely low-cost fabrication of large-area devices in large volumes. We have tried to transfer sub-100 nm patterns, especially sub-30 nm patterns, onto ultraviolet (UV) curable resin on film substrate by RtR-NIL. We demonstrate a 24 nm pattern on a film substrate by RtR-NIL and the method's potential for sub-100 nm patterning.

Paper Details

Date Published: 21 March 2012
PDF: 8 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231J (21 March 2012); doi: 10.1117/12.916584
Show Author Affiliations
Ryoichi Inanami, Toshiba Corp. (Japan)
Tomoko Ojima, Toshiba Corp. (Japan)
Kazuto Matsuki, Toshiba Corp. (Japan)
Takuya Kono, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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