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Proceedings Paper

Resist loss in 3D compact modeling
Author(s): Xin Zheng; Jensheng Huang; Fook Chin; Aram Kazarian; Chun-Chieh Kuo
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Paper Abstract

An enhancement to compact modeling capability to include photoresist (PR) loss at different heights is developed and discussed. A hypsometric map representing 3-D resist profile was built by applying a first principle approximation to estimate the "energy loss" from the resist top to any other plane of interest as a proportional corresponding change in model threshold, which is analogous to a change in exposure dose. The result is compared and validated with 3D rigorous modeling as well as SEM images. Without increase in computation time, this compact model can construct 3D resist profiles capturing resist profile degradation at any vertical plane. Sidewall angle and standing wave information can also be granted from the vertical profile reconstruction. Since this method does not change any form of compact modeling, it can be integrated to validation and correction without any additional work.

Paper Details

Date Published: 13 March 2012
PDF: 6 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83261C (13 March 2012); doi: 10.1117/12.916582
Show Author Affiliations
Xin Zheng, Synopsys, Inc. (United States)
Jensheng Huang, Synopsys, Inc. (United States)
Fook Chin, Synopsys, Inc. (United States)
Aram Kazarian, Synopsys, Inc. (United States)
Chun-Chieh Kuo, Synopsys Taiwan Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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